Edwards high performance STPH301C turbomolecular pump has been designed for use in the harshest of semiconductor applications. The pumps field proven reliability and class-leading performance give maximum process flexibility. The STPH301C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.

Informacje

Features and Benefits
Advanced rotor technology

Higher gas throughput
Maximized process flexibility
Oil free
Low vibration
High reliability
Maintenance free
Harsh process compatible
Increased life

Advanced controller design

Auto tuning
Self diagnostic functions
d.c. motor drive
Battery-free operation

Compact design

Small footprint
Half rack controller
5 axis magnetic suspension system
Zero contamination
Low maintenance
Any orientation operation

Applications

Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
Electron cyclotron resonance (ECR) etch
Film deposition CVD, PECVD, ECRCVD, MOCVD
Sputtering
Ion implantation source, beam line pumping end station
MBE
Diffusion
Photo resist stripping
Crystal/epitaxial growth
Wafer inspection
Load lock chambers
Scientific instruments: surface analysis, mass spectrometry, electron microscopy
High energy physics: beam lines, accelerators
Radioactive applications: fusion systems, cyclotrons

Dane techniczne

Inlet flange	ISO100K
Outlet port	KF40
Purge port	KF10
Water cooling fitting	PT1/4
Pumping Speed
N₂	300 ls^-1
H₂	200 ls^-1
Compression ratio
N₂	>10⁸
H₂	10³
Ultimate pressure with bake out heating	10^-7 Pa
	(10^-9 Torr)
Max continuous outlet pressure	660 Pa
	(5 Torr)
Max Nitrogen throughput	2500 sccm
Rated speed	48000 rpm
Starting time	4 min
Max inlet flange temperature	120 °C
Input voltage	100 to 120 (± 10) V a.c. or
	200 to 240 (± 10) V a.c.
Power consumption	0.6 kVA
Pump weight	15 kg
Controller weight	9 kg

Pliki do pobrania

Edwards Maglev Turbos and the Environment Brochure

Produkty Edwards Vacuum

Pompy Turbomolekularne

STPH301C