STPA803C
Edwards STPA803C turbomolecular pump is designed for use in semiconductor applications. Edwards advanced rotor technology gives class-leading performance for maximum process flexibility. The STPA803C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
Informacje
Features and Benefits
Advanced rotor technology
- Maximized process flexibility
- Oil free
- Low vibration
- High reliability
- Maintenance free
- Harsh process compatible
- Increased life
Advanced controller design
- Auto tuning
- Self diagnostic functions
- d.c. motor drive
- Battery-free operation
Compact design
- Small footprint
- Half rack controller
Applications
- Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
- Electron cyclotron resonance (ECR) etch
- Film deposition CVD, PECVD, ECRCVD, MOCVD
- Sputtering
- Ion implantation source, beam line pumping end station
- MBE
- Diffusion
- Photo resist stripping
- Crystal/epitaxial growth
- Wafer inspection
- Load lock chambers
- Scientific instruments: surface analysis, mass spectrometry, electron microscopy
- High energy physics: beam lines, accelerators
- Radioactive applications: fusion systems, cyclotrons
Dane techniczne
| Inlet flange | ISO160F |
| Outlet port | KF40 |
| Purge port | KF10 |
| Water cooling fitting | PT1/4 |
| Pumping Speed | |
| N2 | 800 ls-1 |
| H2 | 520 ls-1 |
| Compression ratio | |
| N2 | >108 |
| H2 | 103 |
| Ultimate pressure with bake out heating | 10-7 Pa (10-9 Torr) |
| Max continuous outlet pressure | 270 Pa (2 Torr) |
| Max Nitrogen throughput | 1500 sccm |
| Rated speed | 32500 rpm |
| Starting time | 7 min |
| Max inlet flange temperature | 120 °C |
| Input voltage | 200 to 240 (± 10) V a.c. |
| Power consumption | 0.85 kVA |
| Pump weight | 39 kg |
| Controller weight | 9 kg |
Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure