STPA2203C

Edwards STPA2203C is a new turbomolecular pump designed for use in semiconductor applications. It has advanced rotor technology that gives class-leading performance for maximum process flexibility. A new half rack controller gives additional space savings and incorporates d.c. drive technology for battery-free operation. The STPA2203C has been approved for use by major etch, ion implant and deposition equipment manufacturers in the semiconductor and magnetic media industries.

Features and Benefits
Advanced rotor design 

•     Higher gas throughput
•     Maximized process flexibility

5 Axis Magnetic Suspension System 

•     Zero contamination
•     Low maintenance

Corrosion Resistant 

•     Harsh process compatible
•     Increased life

Compact design 

•     Small footprint
•     Half rack controller

Advanced controller design 

•     Auto tuning
•     Self diagnostic functions
•     d.c. motor drive
•     Battery-free operation

Applications

• Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
• Electron cyclotron resonance (ECR) etch
• Film deposition CVD, PECVD, ECRCVD, MOCVD
• Sputtering
• Ion implantation source, beam line pumping end station
• MBE
• Diffusion
• Photo resist stripping
• Crystal/epitaxial growth
• Wafer inspection
• Load lock chambers
• Scientific instruments: surface analysis, mass spectrometry, electron microscopy
• High energy physics: beam lines, accelerators
• Radioactive applications: fusion systems, cyclotrons