Atlas Etch

Abatement solution for Generation 5, 6 and 7 Flat Panel Etch Processes
 
Application challenges
 
Modern FPD (Flat Panel Display) Etch processes combine the use of large PFC gases flows (typically SF6 and/or CF4) with large flows of Chlorine (Cl2) and Hydrochloric acid (HCl). A generation 6 etch process tool will typically combine 12slm of SF6 and/or 8slm of CF4, with 15slm of Cl2 or 15slm HCl. Combustion abatement methods are faced with three challenges: the combustion of large PFC gas flows (PFCs are extremely stable chemical compounds), in the presence of large Cl2 flows (chlorine acts as a flame-suppressant), and the management of acidic by-products (HCl, HF, H2SO4 and SO2).
 
Atlas Etch has successfully met with all three challenges. Optimisation of the combustion process and smart management of the gas input enable destruction and removal efficiencies (DREs) greater than 99% for SF6 and greater than 90% for CF4, even in the presence of Chlorine. The use of corrosion resistant materials in the design of the wet scrubbing stages ensures that Atlas Etch can remove acidic by-products reliably whilst maintaining low water consumption and high process uptime.

Features and Benefits

• Proven high abatement performance for toxic, pyrophoric & corrosive gases

             Reliable handling of associated powders

• Controlled and complete oxidation of hydrogen to safe limits

            Capable of handling up to 200 lpm of hydrogen
            Up to 4 process inlets

Applications

•     Si Epitaxy
•     III-V MOCVD
•     SiGe Epitaxy