Mistral is an electrically-heated hot air oxidation unit coupled with a proven three-stage wet scrubber and self-cleaning inlets. Mistral employs a patented hydrogen inject system and is capable of removing pyrophoric and acid gases) for semiconductor applications such as polysilicon and oxide deposition as well as the high fluorine flows from processes that employ remote nitrogen trifluoride (NF3) clean.
Features and Benefits
- Full interfacing with process tools reduces cost of ownership
- Patented hydrogen inject system
- Suitable for applications employing remote NF3 clean
- Proven corrosion-free design