Inline 250

Edwards offers a range of low-cost, point of use dry abatement systems for semiconductor processing. Each system uses the unique hot bed reactor technology developed for the GRC (Gas Reactor Column) range.
The Inline 250 uses two high capacity cartridges inline, which maximizes the use of cartridge reagent and boosts the capacity of Inline 250 by 150% compared to the M150.
The technology used in the Inline 250 has been proven to give the highest abatement performance of any dry technology for etch.
The high temperature treatment gives permanent gas destruction and removal of halogens, acid gases and other halide etch components. It safely treats toxic organochloride by-products frequently exhausted from etch tools.
The Inline 250 requires no water supply and consequently avoids duct corrosion issues associated with back streaming of moisture. Reactive process by-products are chemically converted to harmless inorganic salts that are locked into the cartridge allowing for safe disposal.


Features and Benefits

  •     Safest treatment by chemical reaction to stable inert salts
  •     Widest range of gases treated, from halogens and acids to ClF3, NF3, C4F8, SF6 etc.
  •     No desorption risks, unique to high temperature systems
  •     No toxic wastes
  •     100% uptime with auto changeover
  •     Continuous abatement even in power failure
  •     Integral heated inlet piping (option)Low energy, low utility requirements
Dane techniczne
  Inlet NW40
  4 alternative positions
  Outlet NW40
  4 alternative positions
  Cabinet Extract 160mm
  2-3 alternative postions
  500m3 / hr
  Nitrogen Outlet 1/4" Swagelok ®
  4-5 bar gauge
Power Requirements  
  Three phase supply 380 / 415 3ph 50Hz
  208v 60Hz
  200v 50 / 60Hz
Mechanical Data  
  Mass 444kg