Edwards STPA803C turbomolecular pump is designed for use in semiconductor applications. Edwards advanced rotor technology gives class-leading performance for maximum process flexibility. The STPA803C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.


Features and Benefits
Advanced rotor technology

  •     Maximized process flexibility
  •     Oil free
  •     Low vibration
  •     High reliability
  •     Maintenance free
  •     Harsh process compatible
  •     Increased life

Advanced controller design

  •     Auto tuning
  •     Self diagnostic functions
  •     d.c. motor drive
  •     Battery-free operation

Compact design

  •     Small footprint
  •     Half rack controller


  •     Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
  •     Electron cyclotron resonance (ECR) etch
  •     Film deposition CVD, PECVD, ECRCVD, MOCVD
  •     Sputtering
  •     Ion implantation source, beam line pumping end station
  •     MBE
  •     Diffusion
  •     Photo resist stripping
  •     Crystal/epitaxial growth
  •     Wafer inspection
  •     Load lock chambers
  •     Scientific instruments: surface analysis, mass spectrometry, electron microscopy
  •     High energy physics: beam lines, accelerators
  •     Radioactive applications: fusion systems, cyclotrons


Dane techniczne
Inlet flange ISO160F
Outlet port KF40
Purge port KF10
Water cooling fitting PT1/4
Pumping Speed  
  N2 800 ls-1
  H2 520 ls-1
Compression ratio  
  N2 >108
  H2 103
Ultimate pressure with bake out heating 10-7 Pa (10-9 Torr)
Max continuous outlet pressure 270 Pa (2 Torr)
Max Nitrogen throughput 1500 sccm
Rated speed 32500 rpm
Starting time 7 min
Max inlet flange temperature 120 °C
Input voltage 200 to 240 (± 10) V a.c.
Power consumption 0.85 kVA
Pump weight 39 kg
Controller weight 9 kg
Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure