STPA2203C

Edwards STPA2203C is a new turbomolecular pump designed for use in semiconductor applications. It has advanced rotor technology that gives class-leading performance for maximum process flexibility. A new half rack controller gives additional space savings and incorporates d.c. drive technology for battery-free operation. The STPA2203C has been approved for use by major etch, ion implant and deposition equipment manufacturers in the semiconductor and magnetic media industries.

Informacje

Features and Benefits
Advanced rotor design 

  •     Higher gas throughput
  •     Maximized process flexibility

5 Axis Magnetic Suspension System 

  •     Zero contamination
  •     Low maintenance

Corrosion Resistant 

  •     Harsh process compatible
  •     Increased life

Compact design 

  •     Small footprint
  •     Half rack controller

Advanced controller design 

  •     Auto tuning
  •     Self diagnostic functions
  •     d.c. motor drive
  •     Battery-free operation


Applications

  • Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
  • Electron cyclotron resonance (ECR) etch
  • Film deposition CVD, PECVD, ECRCVD, MOCVD
  • Sputtering
  • Ion implantation source, beam line pumping end station
  • MBE
  • Diffusion
  • Photo resist stripping
  • Crystal/epitaxial growth
  • Wafer inspection
  • Load lock chambers
  • Scientific instruments: surface analysis, mass spectrometry, electron microscopy
  • High energy physics: beam lines, accelerators
  • Radioactive applications: fusion systems, cyclotrons
Dane techniczne
Inlet flange ISO250F
Outlet port KF40
Purge port KF10
Water cooling fitting PT1/4
Pumping Speed  
  N2 2200 ls-1
  H2 1700 ls-1
Compression ratio  
  N2 >108
  H2 >2.5 x 104
Ultimate pressure 10-6 Pa
  (10-8 Torr)
Maximum allowable backing pressure 400 Pa
  (3 Torr)
Maximum Nitrogen throughput 1500 sccm
Rated speed 27000 rpm
Starting time 7 min
Mounting position Any
Water cooling tlow 2 lmin-1
Water cooling temperature 5-25 °C
Pressure 0.3 MPa
Recommended purge gas flow 20 sccm
Input voltage 200 to 240 (± 10) V a.c.
Power consumption 1.5 kVA
Pump weight 61 kg
Controller weight 12 kg
Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure